Scheduling System and Method

ABSTRACT

A method and apparatus for scheduling in a wafer fab. The method comprising means for weighting inventories according to at least one of logpoints or reticle, and photolithography units, means for scheduling one of said inventories on one of said photolightography units, wherein said one of said inventories has a maximal weighting and means for eliminating any of said inventories not scheduled according to constraints.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation application of U.S. patent application Ser. No. 10/640,438, filed Aug. 13, 2003, which is herein incorporated by reference and which claims priority from provisional application Ser. No. 60/403,089, filed Aug. 13, 2002. The following patent application discloses related subject matter as application Ser. No. 10/352,653, filed Jan. 28, 2003. This referenced application has a common assignee with the present application.

BACKGROUND OF THE INVENTION

The invention relates to semiconductor device manufacturing, and more particularly to scheduling photolithography in a wafer fab.

The manufacture of integrated circuit products typically involves hundreds of processing steps applied to a semiconductor (e.g., silicon) wafer over several weeks. Indeed, a typical wafer fab may at any time contain 50,000 wafers as work in progress and with a 20,000 wafer turnover per month. The basic processing operations in a wafer fab are photolithography, etching-polishing, deposition, implantation, oxidation, and diffusion-anneal plus various cleanings and inspections-measurements; and each of these processing operations has an associated set of tools. Now to yield multilevel-metal CMOS integrated circuits, a single wafer may by subject to 10-30 photolithography operations, 10-20 etching-polishing operations, 5-10 implantation operations, and so forth with these operations in multiple sequences such as photolithography-implant-anneal and deposition-photolithography-etch. Thus the sequence of processing operations (logpoints) for a single wafer is reentrant in that the same tool may be used multiple times during the wafer processing. And the problem is to schedule the wafers for processing operations, typically in lots of 25 wafers which all receive identical processing, on the tools in the fab to maximize utilization of the tools. Further, stochastic events such as tool breakdowns or varying lot priorities add to the scheduling complications.

A further complication of wafer fab scheduling arises from the simultaneous manufacture of several different integrated circuit products; each product has its own sequence of processing operations and requires its own set of reticles for use in photolithography operations. Thus despite a factory possessing several photolithography units (photoresist coaters, scanners-steppers for patterned photoresist exposure, exposed photoresist developers), the high cost of reticles and the limited reticle capacity of a scanner makes the photolithography units more like unique, mutually exclusive resources within a factory. And at any time perhaps 10% of the wafers in the fab (e.g., 5,000 wafers or 200 lots) are awaiting photolithography operation, and scheduling a particular lot at a particular logpoint for a particular scanner requires the corresponding reticle be loaded into the scanner.

Akcalt et al, Cycle-Time Improvements for Photolithography Process in Semiconductor Manufacturing, 14 IEEE Tran.Semi.Manuf. 48 (2001) describes simulations of a scheduling system with first-in/first-out dispatching.

However, the known wafer fab scheduling methods do not provide effective real time usage.

SUMMARY OF THE INVENTION

The present invention provides a method and apparatus for scheduling in a wafer fab. The method comprising means for weighting inventories according to at least one of logpoints or reticle, and photolithography units, means for scheduling one of said inventories on one of said photolightography units, wherein said one of said inventories has a maximal weighting and means for eliminating any of said inventories not scheduled according to constraints.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a flow diagram for a first preferred embodiment method.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS 1. Overview

The preferred embodiment methods for a wafer fab solve the problem of which scanner (or stepper) runs which reticle while also managing current inventory and production line linearity. Managing reticles appropriately is extremely important in that tool time is not wasted while requisitioning a reticle from one scanner to another causing lost production opportunity. It is also important to maintain line linearity so that the utilization of the factory's other capital is maximized, but this must be balanced against current inventory at the scanners for cycle time considerations.

The preferred embodiment methods manage all three concerns and have demonstrated to perform at near optimality with minimal computational time making them very successful in making intelligent resource management decisions. The three preferred embodiment methods have differing emphases: The first places more emphasis on maintaining fab linearity, the second places the most emphasis on reticle/inventory management, and the third is a moderate balance between the two former methods.

2. First Preferred Embodiment

Initially define the resource constraints for the method, which will also apply to the second and third preferred embodiment methods. These constraints include the number of each type of reticle in the fab (reticle_max_cnt_((Reticle)) where the subscript “reticle” denotes the independent variable), the reticle capacity of each scanner (scanner_ret_cap_((Scanner))), and the maximum number of scanners at any individual logpoint (LP_scanner_max_((LP))). Note that typical values could be as follows: reticle_max_cnt_((Reticle)) in the range 1 to 10 (a small number due to the expense of reticles with multiple reticles only for high volume products having cheap reticles); scanner_ret_cap_((Scanner)) in the range 4 to 12 (capacity equal to 12 reticles is common, but not utilizing the full capacity permits easier loading and unloading of reticles); and LP_scanner_max_((LP)) in the range 1 to 3 (for a wafer fab with 20-30 scanners, limiting the number at any particular logpoint helps spread resources over the sequence of operations for a product and avoids bunching up.

Once these constraints have been determined, the first preferred embodiment method analyzes the current inventory situation for each combination of scanner/logpoint.

First identify are all pre-pattern (process) inventories (work-in-progress) in the queue at each scanner by logpoint (WIP_((LP, Scanner))). As a simple illustrative example, a fab with 4 scanners may have lots awaiting photolithography as follows:

scanner1 WIP_((100,1))=3, WIP_((200,1))=4, WIP_((300,1))=2,

scanner2 WIP_((100,2))=3, WIP_((400,2))=5, WIP_((500,2))=2, WIP_((600,2))=4,

scanner3 WIP_((250,3))=2, WIP_((400,3))=3,

scanner4 WIP_((550,4))=1, WIP_((650,4))=1, WIP_((700,4))=5, WIP_((750,4))=1,

Once these inventories have been found, each is divided by the maximum logpoint WIP for each scanner to give a relative weighting of each logpoint's WIP to the heaviest-loaded logpoint for that scanner (LP_Weight_((LP, Scanner))). In the foregoing example,

scanner1: LP_Weight_((100, 1))=0.75, LP_Weight_((200, 1))=1.0,

-   -   LP_Weight_((300, 1))=0.5.

scanner2: LP_Weight_((100, 2))=0.6, LP_Weight_((400,2))=1.0,

-   -   LP_Weight_((500,2))=0.4, LP_Weight_((600,2))=0.8,

scanner3: LP_Weight_((250,3))=0.67, LP_Weight_((400,3))=1.0,

scanner4: LP_Weight_((550,4))=0.2, LP_Weight_((650.4))=0.2,

-   -   LP_Weight_((700,4))=1.0, LP_Weight_((750,4))=0.2.

This logpoint weighting is then multiplied back against the WIP at each logpoint/scanner to yield a weight (WIP_Weight_((LP, Scanner))). Again, in the foregoing example:

scanner1: WIP_Weight_((100,1))=3*0.75=2.25, WIP_Weight_((200, 1))=4*1.0=4.0,

-   -   WIP_Weight_((300, 1))=2*0.5=1.0.

scanner2: WIP_Weight_((100,2))=3*0.6=1.8, WIP_Weight_((400,2))=5*1.0=5.0,

-   -   WIP_Weight_((500,2))=2*0.4=0.8, WIP_Weight_((600,2))=4*0.8=3.2.

scanner3: WIP_Weight_((250,3))=2*0.67=1.33, WIP_Weight_((400,3))=3*1.0=3.0,

scanner4: WIP_Weight_((550,4))=1*0.2=0.2, WIP_Weight_((650,4))=1*0.2=0.2,

-   -   WIP_Weight_((700,4))=5*1.0=5.0, WIP_Weight_((750,4))=1*0.2=0.2,

In summary, the computations are:

${W\; I\; P_{({{LP},{Scanner}})}} \equiv {\sum\limits_{{Lot} = 0}^{\infty}{CurrentQuantity}_{({{Lot},{LP}})}}$ ${LP\_ Weight}_{({{LP},{Scanner}})} \equiv \frac{W\; I\; P_{({{LP},{Scanner}})}}{{MAX}\left( {W\; I\; P_{({Scanner})}} \right)}$ WIP_Weight_((LP, Scanner)) ≡ W I P_((LP, Scanner)) * LP_Weight_((LP, Scanner))

WIP_Weight_((LP, Scanner)) gives a relative desire to push wafers out of the logpoint while managing to generate a fair value to compare inventory loadings across scanners regardless of the total scanner inventory comparisons. Indeed, in the example, both scanner1 and scanner2 for LP=100 have WIP=4, but WIP_Weight_((100,1))=2.25 is greater than WIP_Weight_((100, 2))=1.8 due to the heavier maximum loading of scanner2 by WIP_((400,2)). Thus the heavier maximum loading of scanner2 by LP=400 makes processing the LP=100 less desirable on scanner2 than on scanner1.

Now using these variables, the first preferred embodiment method, which emphasizes linearity, proceeds iteratively as follows (see FIG. 1). First, sort all logpoint/scanner combinations in descending order of WIP_Weight_((LP, Scanner)). The first logpoint/scanner to be scheduled is the one at the top of the list. At this juncture, count the number of times this logpoint has been scheduled so far (=1) and the number of times that this scanner has been scheduled so far (=1) and compare these values to the corresponding constraints: LP_scanner_max_((LP)) and scanner_ret_cap_((Scanner)), respectively. If either value is equal to its constraint, all other logpoint/scanner combinations involving that constraint are eliminated from the list.

The remaining logpoint/scanner possibilities are recomputed and then again sorted in descending order of the new WIP_Weight_((LP, Scanner)) and the process is iterated (item at the top of the list is scheduled, constraints compared, and any necessary related logpoint/scanner items eliminated) until the pool of non-eliminated WIP_((LP,scanner))'s is exhausted or all of the constraints are full. And the simplicity of the computations permits frequent re-computations to adapt to changing circumstances.

When a photolithography unit has finished operations on the lots of a scheduled WIP_((LP, Scanner)), the count of number of times that this logpoint/scanner has been scheduled is decremented by 1, so the constraints LP_scanner_max_((LP)) and/or scanner_ret_cap_((Scanner)) may become unfilled. Also, a finished lot has its LP incremented to the next LP in its process flow.

When a new lot arrives for photolithography operation, it is allocated to a scanner and becomes part of the inventory. The scanner allocation may be according to the sizes of existing scanner inventories and may also include combining with other lots which are at the same logpoint so that the same reticle can be used without transferring the reticle from one scanner to another. Also, for critical dimensions, using the same scanner for a lot as was used in a prior photolithography operation may be desired.

Again with the foregoing example, the first sorting yields a tie with WIP_Weight_((400,2))=WIP_Weight_((700,4))=5.0, so randomly pick WIP_Weight_((400,2)) and schedule it (this leads to a reticle for LP=400 being loaded into scanner2). Then check the constraints LP_scanner_max₍₄₀₀₎ and scanner_ret_cap₍₂₎. If, for example, if LP_scanner_max₍₄₀₀₎=1, then eliminate WIP_Weight_((400,3)). Next, recompute the WIP weights for the remaining considered inventories. This would again lead to WIP_Weight_((700,4))=5.0 and it would be scheduled for scanner4, and the constraints LP_scanner_max₍₇₀₀₎ and scanner_ret_cap₍₄₎ checked for inventories to eliminate. Iterations continue scheduling until the non-eliminated inventories are all gone.

This scheduling method manages fab linearity better with lower values of LP_scanner_max_((LP)).

The foregoing computations are simple and can be performed frequently to dynamically adapt to lots leaving a scanner's queue (entering the processing stage) and to new lots arriving for photolithography operations.

3. Second Preferred Embodiment

The second preferred embodiment methods require another set of calculations and emphasize reticle and inventory management over fab linearity. Essentially, these methods are the same as the first preferred embodiment method except the reticle variable is added to the summation and comparison calculations. First identify are all pre-pattern (process) inventories at each scanner by reticle (WIP_((Reticle,Scanner))). Once these inventories have been found, each is divided by the maximum reticle WIP for each scanner to give a relative weighting of each reticle's WIP to the heaviest loaded reticle for that scanner (LP_Weight_((Reticle,Scanner))). This is analogous to the first preferred embodiment method except that it is more constrained because it is calculated on the reticle/scanner instead of logpoint/scanner level. Next, multiply the value of LP_Weight_((LP,Scanner,Reticle)) against the WIP for each reticle/scanner combination, WIP_((Reticle,Scanner)), to produce the WIP_Weight_((Reticle, Scanner)) values. Now, the second preferred embodiment method follows the first preferred embodiment method of iteration except for addition of the reticle_max_cnt_((Reticle)) constraint so as to not exceed the supply of reticles. That is, proceed as follows: (i) compute and sort the WIP_Weight_((Reticle,Scanner)) in descending order, (ii) schedule the item at the top of the sorted list, (iii) check the constraints, (iv) eliminate all items on the list which would violate constraints if scheduled; and (v) iterate (i)-(iv) with the non-eliminated and non-scheduled inventories.

In summary, the computations are:

$\mspace{20mu} {{W\; I\; P_{({{Reticle},{Scanner}})}} \equiv {\sum\limits_{{Lot} = 0}^{\infty}{CurrentQuantity}_{({{Lot},{Reticle}})}}}$ $\mspace{20mu} {{LP\_ Weight}_{({{Reticle},{Scanner}})} \equiv \frac{W\; I\; P_{({{Reticle},{Scanner}})}}{{MAX}\left( {W\; I\; P_{({Scanner})}} \right)}}$ WIP_Weight_((Reticle, Scanner)) ≡ W I P_((Reticle, Scanner)) * LP_Weight_((Reticle, Scanner))

4. Third Preferred Embodiment

The third preferred embodiment methods also require another set of calculations and emphasize reticle and inventory management over fab linearity. These methods are analogous to the second preferred embodiment methods with an additional logpoint weighting. First, identify are all pre-pattern (process) inventories at each scanner by logpoint and reticle (WIP_((LP,Scanner,Reticle))). Once these inventories have been found, each is divided by the maximum reticle/logpoint/scanner WIP. This gives a relative weighting of each reticle's WIP to the heaviest loaded reticle/logpoint for the scanner (LP_Weight_((LP, Scanner, Reticle))). Continue analogously with foregoing methods of multiplying the LP weight by the WIP inventory, but the third preferred embodiment methods insert one intermediate step: multiply the weighting LP_Weight_((LP, Scanner, Reticle)) value by the LP_Weight_((LP, Scanner)) value (from the first preferred embodiment methods). This creates not only a logpoint weighting, but also a reticle weighting to each group of inventory. The resulting weighting value then multiplies the inventory WIP_((LP,Scanner, Reticle)) to produce the WIP_Weight_((LP,Scanner,Reticle)) value. The iterative scheduling procedure follows the second (or first) preferred embodiment methods. This third preferred embodiment method can be tuned like the first preferred embodiment methods by changing the values of LP_scanner_max_((LP)).

The computation modified by the inserted intermediate step:

WIP_Weight_((Reticle,Scanner)) ≡WIP _((Reticle,Scanner)) *LP_Weight_((Reticle,Scanner)) *LP_Weight_((LP,Scanner)) 

1. An apparatus for scheduling in a wafer fab, comprising: (a) means for weighting inventories according to at least one of logpoints or reticle, and photolithography units; (b) means for scheduling one of said inventories on one of said photolightography units, wherein said one of said inventories has a maximal weighting; and (c) means for eliminating any of said inventories not scheduled according to constraints.
 2. The apparatus of claim 1 further comprising a means for repeating the scheduling in the wafer fab, wherein said repetition schedules at least of not-scheduled or not-eliminated inventory.
 3. The apparatus of claim 1, wherein said inventories are denoted by the dependent variable WIP_((LP,scanner)) with the independent variable LP designating at least one of a logpoint or reticle, and the independent variable scanner designating photolithography unit.
 4. The apparatus of claim 3, wherein said means for weighting of claim 1 comprises a multiplication of at least one of WIP_((LP,scanner)) or WIP_((reticle,scanner)) by the fraction at least one of WIP_((LP,scanner))/max_(M) (WIP_((M,scanner))) or WIP_((reticle,scanner))/max_(M) (WIP_((M,scanner))), where max_(M) (WIP_((M,scanner))) denotes for each value of the scanner variable the maximum of at least one of WIP_((LP,scanner)) or WIP_((reticle,scanner)) with respect to the at least one of LP or reticle variable.
 5. A system for scheduling in a wafer fab, comprising: (a) means for weighting inventories according to at least one of logpoints or reticles, and photolithography units; (b) means for scheduling one of said inventories on one of said photolightography units wherein said one of said inventories has a maximal weighting; and (c) means for eliminating any of said inventories not scheduled according to constraints.
 6. The system of claim 5 further comprising a means for repeating the scheduling in the wafer fab, wherein said repetition schedules at least of not-scheduled or not-eliminated inventory.
 7. The system of claim 6, wherein said inventories are denoted by at least one of a dependent variable WIP_((reticle,scanner)) or WIP_((LP,scanner)) with the at least one of an independent variable reticle or logpoint designating at least one of a reticle or logpoint, and the independent variable scanner designating photolithography unit.
 8. The system of claim 6, wherein said means for weighting comprises multiplication of at least one of WIP_((reticle,scanner)) or WIP_((LP,scanner)) by the fraction at least one of WIP_((reticle,scanner))/max_(M) (WIP_((M,scanner))) or WIP_((LP,scanner))/max_(M) (WIP_((M,scanner))) where max_(M) (WIP_((M,scanner))) denotes for each value of the scanner variable the maximum of at least one of WIP_((reticle,scanner)) or WIP_((LP,scanner)) with respect to the at least one of reticle or logpoint variable. 